Three-dimensional electron-beam resist profile simulatorMONIWA, A; YAMAGUCHI, H; OKAZAKI, S et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 2771-2775, issn 1071-1023Conference Paper

Conducting electron beam resists based on polyanilineHUPCEY, M. A. Z; ANGELOPOULOS, M; GELORME, J. D et al.SPIE proceedings series. 1998, pp 369-374, isbn 0-8194-2776-4Conference Paper

Electron beam direct writing technology for fine gate patterningSATO, K; SHIRAI, S; HAYAKAWA, H et al.SPIE proceedings series. 1998, pp 326-333, isbn 0-8194-2776-4Conference Paper

Optimization of pattern shape in electron-beam cell projection lithographyEMA, T; YAMASHITA, H; NAKAJIMA, K et al.SPIE proceedings series. 1998, pp 464-470, isbn 0-8194-2776-4Conference Paper

Low-energy electron beam enhanced etching of Si(100)-(2×1) by molecular hydrogenGILLIS, H. P; CLEMONS, J. L; CHAMBERLAIN, J. P et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 2729-2733, issn 1071-1023Conference Paper

Advanced electron-beam pattern generation technology for 180 nm masksABBOUD, F; SAUER, C; WANG, W et al.SPIE proceedings series. 1998, pp 19-27, isbn 0-8194-2669-5Conference Paper

Photomask in-plane distortion induced during e-beam patterningSHAMOUN, B; SPRAGUE, M; ENGELSTAD, R et al.SPIE proceedings series. 1998, pp 275-279, isbn 0-8194-2776-4Conference Paper

Dynamic image placement accuracy of a stencil maskTAKENAKA, H; YAMASHITA, H; TAKAHASHI, K et al.SPIE proceedings series. 2002, pp 559-569, isbn 0-8194-4434-0, 2VolConference Paper

Nikon EPL tool development summaryMIURA, Takaharu; SATO, Tatsuo; MIYAZAKI, Masaya et al.SPIE proceedings series. 2002, pp 527-534, isbn 0-8194-4434-0, 2VolConference Paper

Fabrication of micro optical surface profiles by using gray scale masksKLEY, E.-B; THOMA, F; ZEITNER, U. D et al.SPIE proceedings series. 1998, pp 254-262, isbn 0-8194-2715-2Conference Paper

Electron beam lithography system with new correction techniquesTAKAHASHI, Y; YAMADA, A; OAE, Y et al.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 2794-2798, issn 1071-1023Conference Paper

Electron beam block exposureYASUDA, H; SAKAMOTO, K; YAMADA, A et al.Japanese journal of applied physics. 1991, Vol 30, Num 11B, pp 3098-3102, issn 0021-4922, 1Article

EPL mask fabricationLERCEL, Michael; WILLIAMS, Carey; LAWLISS, Mark et al.SPIE proceedings series. 2002, pp 790-798, isbn 0-8194-4517-7, 9 p.Conference Paper

DY-7 sub-0.1 micron EB lithography systemWENQI GU; NIANKAN KANG; HONG XUE et al.Microelectronic engineering. 2001, Vol 57-58, pp 191-198, issn 0167-9317Conference Paper

Line-width controllability depending on electron-beam blur and resist thicknessITOH, M; ANDO, A; MAGOSHI, S et al.SPIE proceedings series. 1998, pp 442-449, isbn 0-8194-2776-4Conference Paper

Measurement of beam current and beam diameter of an E-beam lithography SystemSAXENA, Renuka; PRASAD, Manju; SHARMA, M. U et al.SPIE proceedings series. 2002, pp 713-717, isbn 0-8194-4500-2, 2VolConference Paper

Analysis of critical parameters for EPL mask fabricationLERCEL, Michael.SPIE proceedings series. 2002, pp 570-582, isbn 0-8194-4434-0, 2VolConference Paper

Hybrid deep UV-e-beam lithography for the fabrication of dual damascene structuresMOLLARD, L; TEDESCO, S; DAL'ZOTTO, B et al.Microelectronic engineering. 2001, Vol 57-58, pp 269-275, issn 0167-9317Conference Paper

High precision mask fabrication for deep X-ray lithography using 40-kV shaped electron beam lithographySCHMIDT, Andreas; HIMMELSBACH, Gerhard; LÜTTGE, Regina et al.Microelectronic engineering. 2001, Vol 57-58, pp 761-767, issn 0167-9317Conference Paper

High accurate CD control at stitching region for Electron Beam Projection LithographyFUJIWARA, Tomoharu; IRITA, Takeshi; SHIMIZU, Sumito et al.SPIE proceedings series. 2001, pp 727-735, isbn 0-8194-4029-9Conference Paper

PYRAMID : A hierarchical, rule-based approach toward proximity effect correction-part I : Exposure estimationLEE, S.-Y. SR; COOK, B. D.IEEE transactions on semiconductor manufacturing. 1998, Vol 11, Num 1, pp 108-116, issn 0894-6507Article

PYRAMID : A hierarchical, rule-based approach toward proximity effect correction-part II : CorrectionCOOK, B. D; LEE, S.-Y.IEEE transactions on semiconductor manufacturing. 1998, Vol 11, Num 1, pp 117-128, issn 0894-6507Article

Advantages of variable shaped E-beam writers for mask makingEHRLICH, C.SPIE proceedings series. 1998, pp 28-33, isbn 0-8194-2669-5Conference Paper

Koehler illumination-based method to improve beam size controllabilityHATTORI, K; SUNAOSHI, H; ANDO, A et al.SPIE proceedings series. 1998, pp 503-510, isbn 0-8194-2776-4Conference Paper

Calculation of a proximity resist heating in variably shaped electron beam lithographyNAKAJIMA, K; AIZAKI, N.Journal of vacuum science & technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena. 1992, Vol 10, Num 6, pp 2784-2788, issn 1071-1023Conference Paper